Latest News
- March 2010SUSS now introduces Source-Mask Optimization for Mask Aligner Lithography. Source-Mask Optimization (SMO) is a photolithography enhancement technique commonly used in optical lithography to compensate for image errors due to diffraction and process effects. Source-Mask Optimization comprises different measures like Customized Illumination, Optical Proximity Correction (OPC), Polarized Phase Shift Masks (P:PSM) and Resolution Enhancement Techniques (RET). Primary goals are to improve CD control, increase resolution and depth of focus (DOF), improve manufacturability and enlarge the process window.
Information on Source-Mask Optimization can be found on www.mask-aligner.info. - February 2010New article online: Micro-Optics: From High-End to Mass-Market - Optik & Photonik No 4, (2009) (pdf - 324kb)
- Januar 2010Top ranking: The article "Inside Wafer-Level Cameras" achieved rank 39 in the Semiconductor_International's Top 100 list for 2009
(Authors: Reinhard Voelkel, SUSS MicroOptics SA, Neuchâtel, Switzerland; Ralph Zoberbier, SUSS MicroTec Lithography, Garching, Germany; publication in Semiconductor International, 2/1/2009) 2009
- June 2009SUSS MicroTec launches with the MO Exposure Optics a new illumination system designed for all generations of manual and automatic SUSS mask aligners. The new optics is based on unique and high quality microlens arrays to provide higher intensity, improved exposure light uniformity and customized illumination shaping to further optimize the process window and yield in contact and proximity lithography. MO Exposure Optics (patent pending) has been exclusively developed by SUSS MicroOptics.
2008
- October 2008New products: Concave Microlens Arrays
- October, 2008New products: 2D random diffusers
- June 2008Improved Flat-Top 10 available!
- May 19, 2008New website online:
2007
- October 10, 2007 ISO 9001 Certification Accomplished:
SUSS MicroOptics now provides concave microlens arrays!
SUSS MicroOptics now provides a larger range of 2D random diffusers!
SUSS MicroOptics has improved Flat-Top 10, a fly's eye condenser with +/-10° divergence angle. It completes the enhanced fly's eye generation with Flat-Top 5 (+/-5°) and Flat-Top 14 (+/-14°). More information can be found in our technical data sheet 14 about flat-top generator and fly's eye condensers.
Our new website with improved design is now online!
SUSS MicroOptics is proud to announce that we are now ISO 9001 certified.
